Hitachixin Co., Ltd. TDM100-H2O gas sensor

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  • Model : TDM100-H2O
  • Category: Gas Sensors
  • Brand : Hitachi Shin Co., Ltd.
  • Delivery Time: Request for a Quote for Further Details
  • Manufacturer: Hitachi Shin Co., Ltd.

Products

TDM100-H20 laser water sensor

Product introduction:



TDM100-H20Laser water sensor is a tunable semiconductor laser absorption spectrometer technology(TDLAS)A micro-water analysis sensor developed based on the principle can be used for micro-water detection of background gases such as sulfur hexafluoride,hydrogen,nitrogen,natural gas,and air. The measurement is accurate,the response is fast,and it is not affected by the ambient temperature.



Features:


·Suitable for humidity measurement in corrosive gas environments and harsh environments

·No refrigeration required,measurement is not affected by background gas liquefaction

·Fast response speed,the test results can be obtained immediately after the air chamber replacement is completed



Technical Parameters:


Detection gas and range:

Detect gas type

Measuring range

Remark

H2O

(-60℃~20℃) or (10~236000)μL/L

The measured gas has no condensation

*Other ranges and gas types not involved can be customized


General characteristics:

Detection principle

Tunable semiconductor laser absorption spectroscopy technology(TDLAS)

size

181 mm×50mm×60 mm (L×W×H)

Preheat time

2min (preheating time)

Flow

300ml~3L/min

Sampling method

Pipe type

Measurement parameters:

serial number

project

dew point indicator

01

Indication error

2℃

02

resolution

0.1℃

03

Response time

20s

Electrical characteristics:

Operating Voltage

(5~28) VDC

Working current

average power

<5W

Peak power

<7W

Signal output mode

Modbus


Environmental conditions:

Operating temperature

(-10~40)℃ (compensation temperature)

Working humidity

(0~95%)RH (no condensation)

Storage temperature

(-20~60)℃

air pressure

(80~105)kPa

*: The above typical values are based on (101.3kPa,20℃500mL/minMeasured in an environment of clean gas without condensation at flow rate).